Indium Tin Oxide, ITO, In 2 O 3 /SnO 2 , 90/10 wt% (sputtering target)

Empirical Determination of Z-Factor

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Unfortunately, Z Factor and Shear Modulus are not readily available for many materials. In this case, the Z-Factor can also be determined empirically using the following method:

• Deposit material until Crystal Life is near 50%, or near the end of life, whichever is sooner.
• Place a new substrate adjacent to the used quartz sensor.
• Set QCM Density to the calibrated value; Tooling to 100%
• Zero thickness
• Deposit approximately to A of material on the substrate.
• Use a profilometer or interferometer to measure the actual substrate film thickness.
• Adjust the Z Factor of the instrument until the correct thickness reading is shown.

Another alternative is to change crystals frequently and ignore the error. The graph below shows the % Error in Rate/Thickness from using the wrong Z Factor. For a crystal with 90% life, the error is negligible for even large errors in the programmed versus actual Z Factor.

Titanium-Silicon (Ti-Si) sputtering targets play a vital role in the production of high-performance thin films for various industries, including electronics, optics, and decorative coatings. For procurement professionals, selecting the right sputtering target supplier is critical to ensuring consistent quality, efficient production, and cost-effectiveness. This article explores ten key factors that buyers should consider, with insights into how Advanced Targets Materials Co., Ltd excels in meeting these demands.

1. Purity and Material Quality

High-purity materials are essential for sputtering targets to produce defect-free thin films. Impurities can compromise film performance and reliability, particularly in applications such as semiconductors and optical coatings. Advanced Targets ensures consistent high purity in their Ti-Si sputtering targets, with purity levels exceeding 99.5%, meeting the most stringent industry requirements.

2. Titanium-Silicon Ratio

The Ti-Si ratio is critical to determining the properties of the thin film, such as hardness, conductivity, and corrosion resistance. Common ratios like Ti:Si = 90:10 or 80:20 are tailored to specific applications. Advanced Targets offers customizable alloy compositions, enabling clients to select ratios that align perfectly with their needs.

3. Size and Shape Customization

Procurement professionals must ensure that sputtering targets are compatible with their equipment. Advanced Targets specializes in manufacturing sputtering targets in various shapes and sizes, from circular to rectangular, with precise tolerances. This ensures a perfect fit for different sputtering systems, enhancing production efficiency.

4. Uniformity and Density

Uniform composition and high density are crucial for producing consistent thin films. Advanced Targets employs cutting-edge powder metallurgy processes to achieve exceptional uniformity and density in their Ti-Si sputtering targets, minimizing defects and ensuring high-quality coatings.

5. Compatibility and Adaptability

Advanced Targets’ Ti-Si sputtering targets are engineered for compatibility with a wide range of physical vapor deposition (PVD) systems. This adaptability allows buyers to integrate their products seamlessly into existing production lines without additional modifications.

6. Thin Film Performance

Thin film properties such as hardness, wear resistance, and electrical conductivity are directly influenced by the quality of sputtering targets. Advanced Targets leverages advanced R&D collaborations with institutions like the Institute of Process Engineering at the Chinese Academy of Sciences to continuously improve their products. Their Ti-Si targets deliver superior thin film performance, particularly in high-demand applications.

7. Production Capacity and Lead Times

For high-volume production, timely delivery is critical. Advanced Targets boasts extensive production capabilities and advanced manufacturing equipment, enabling them to meet large orders while maintaining short lead times. Their commitment to rapid response ensures that procurement schedules remain on track.

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8. Cost and Value Efficiency

Balancing cost and quality is a key consideration for buyers. Advanced Targets offers competitive pricing without compromising on quality, thanks to their efficient production processes and expertise in material science. Their products provide excellent value, helping clients control costs while achieving optimal performance.

9. Quality Control and Certification

Reliable suppliers adhere to strict quality standards. Advanced Targets’ production processes are ISO-certified, ensuring that every Ti-Si sputtering target undergoes rigorous testing for composition, density, and surface quality. Their products meet global industry standards, providing peace of mind for buyers.

10. Technical Support and After-Sales Service

Comprehensive technical support and responsive after-sales service are critical for ensuring smooth operations. Advanced Targets offers expert guidance on installation, troubleshooting, and optimizing thin film deposition processes. Their customer-centric approach ensures long-term partnerships built on trust and reliability.

The Advanced Targets Advantage

Advanced Targets Materials Co., Ltd is a global leader in the manufacturing of sputtering targets, arcing cathodes, and evaporation materials. Here’s why they stand out in the industry:

1. Innovation-Driven R&D: Collaborations with leading institutions drive continuous improvement and innovation in sputtering target technology.

2. State-of-the-Art Manufacturing: Advanced equipment and powder metallurgy techniques ensure superior product quality and consistency.

3. Broad Product Range: In addition to Ti-Si targets, Advanced Targets offers binary and multi-component alloys such as Cr, TiAl, CrAl, and TiAlSi, catering to diverse applications.

4. Global Reputation: Trusted by leading PVD service providers worldwide, Advanced Targets is synonymous with quality and reliability.

Market Trends in Titanium-Silicon Sputtering Targets

The global sputtering target market is expected to grow at a CAGR of 5.2% from to , driven by increasing demand in electronics, renewable energy, and advanced coatings. Titanium-Silicon targets, known for their exceptional performance in wear-resistant and optical applications, are gaining significant traction. Manufacturers like Advanced Targets are at the forefront of this growth, delivering innovative solutions to meet evolving industry needs.

Conclusion

Selecting the right Titanium-Silicon sputtering target supplier is a strategic decision that impacts product quality, production efficiency, and overall business success. By focusing on factors such as purity, customization, compatibility, and technical support, procurement professionals can make informed choices. Advanced Targets Materials Co., Ltd combines innovation, expertise, and customer-centric service to deliver high-quality Ti-Si sputtering targets that meet the diverse needs of the PVD thin film industry.

Partner with Advanced Targets to ensure your next project benefits from cutting-edge technology, consistent quality, and unparalleled reliability.

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